Deposition and field-emission characterization of electrically conductive nitrogen-doped diamond-like amorphous carbon films
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.1756878
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Chemical vapor deposition of a-CNx:H films for electron field emission using band supermagnetron plasma;Journal of Physics: Conference Series;2014-06-03
2. Influence of deposition parameters on the microstructure and properties of nitrogen-doped diamondlike carbon films;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2010-11
3. Deposition of amorphous carbon nitride films using Ar/N2 supermagnetron sputter;Thin Solid Films;2010-04
4. Sputter-assisted plasma CVD of wide or narrow optical bandgap amorphous CNx:H films using i-C4H10/N2 supermagnetron plasma;Thin Solid Films;2008-05
5. Field-emission characteristics of diamond-like amorphous carbon films deposited by mixed gas (N2 or H2) controlled i-C4H10 supermagnetron plasma;Thin Solid Films;2007-04
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