Plasma doping two-dimensional characterization using low energy x-ray emission spectroscopy and full wafer secondary ion mass spectrometry/angle-resolved x-ray electron spectroscopy techniques
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Published:2010-01
Issue:1
Volume:28
Page:C1D1-C1D4
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ISSN:2166-2746
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Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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language:en
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Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Author:
Qin Shu,Morinville Wendy,Zhuang Kent,Fabreguette Francois,McTeer Allen,Hu Y. Jeff,Lu Shifeng
Publisher
American Vacuum Society
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Cited by
1 articles.
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1. Current literature in mass spectrometry;Journal of Mass Spectrometry;2010-08