Effect of thermodynamic parameters on properties of silicon-carbon films prepared by radio-frequency plasma-enhanced chemical vapor deposition for anti-reflective and photo-luminescent coatings-Reference-Cited by-同舟云学术

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Effect of thermodynamic parameters on properties of silicon-carbon films prepared by radio-frequency plasma-enhanced chemical vapor deposition for anti-reflective and photo-luminescent coatings

Published:2021-07 Issue:4 Volume:39 Page:042203
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Hernández-Montero William W.¹,Itzmoyotl-Toxqui Adrián¹,Zúñiga-Islas Carlos¹

Affiliation:

1. Departamento de Electrónica, Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE), C.P. 72840 Tonantzintla, Puebla, Mexico

Funder

Consejo Nacional de Ciencia y Tecnología

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0001052

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1. Mid-infrared emission of germanium-tin films produced by sputtering;Journal of Vacuum Science & Technology B;2024-03-01

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