Effects of deposition parameters on optical loss for rf‐sputtered Ta2O5 and Si3N4 waveguides-Reference-Cited by-同舟云学术

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Effects of deposition parameters on optical loss for rf‐sputtered Ta2O5 and Si3N4 waveguides

Published:1979-03 Issue:2 Volume:16 Page:307-310
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Paulson W. M.,Hickernell F. S.,Davis R. L.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.569933

Cited by 37 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Sol-gel prepared amorphous Ta2O5 thin film for application in high LIDT antireflection coating and UV photodetection;Optical Materials;2023-08

2. Optical properties and current conduction in annealed (Ta2O5)0.94 – (TiO2)0.06 thin films;Superlattices and Microstructures;2021-10

3. Free-standing tantalum pentoxide waveguides for gas sensing in the mid-infrared;Optical Materials Express;2021-08-23

4. Electrical and optical properties of (Ta2O5)1−x–(TiO2)x films, x = 0.035, prepared by sputtering of ceramic and mosaic (Ta, Ti) metal targets;Journal of Applied Physics;2021-07-21

5. Influence of post-deposition annealing on electrical and optical properties of (Ta2O5)1-x - (TiO2)x thin films, x ≤ 0.08;Ceramics International;2021-06

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