Use of light scattering in characterizing reactively ion etched profiles-Reference-Cited by-同舟云学术

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Use of light scattering in characterizing reactively ion etched profiles

Published:1991-05 Issue:3 Volume:9 Page:664-668
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Giapis Konstantinos P.,Gottscho Richard A.,Clark Linda A.,Kruskal Joseph B.,Lambert Diane,Kornblit Avi,Sinatore Dino

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577386

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Laplace sensitivity operator enhances the calculation efficiency of OCD metrology;Optics Express;2023-01-09

2. Recognition of diffraction-grating profile using a neural network classifier in optical scatterometry;Journal of the Optical Society of America A;2008-06-24

3. Modeling of the chemically assisted ion beam etching process: Application to the GaAs etching by Cl2∕Ar+;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2007-01

4. Profile parameter accuracy determined from scatterometric measurements;SPIE Proceedings;2002-07-11

5. Mathematical analyses of inverse scatterometry;SPIE Proceedings;2002-07-01

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