Ultraviolet transmittance of SU-8 photoresist and its importance in multi-wavelength photolithography-Reference-Cited by-同舟云学术

Ultraviolet transmittance of SU-8 photoresist and its importance in multi-wavelength photolithography

Published:2018-09 Issue:5 Volume:36 Page:051601
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Parsi Sreenivas Vijay V.¹,Winkler Andreas²,Harazim Stefan¹,Schmidt Oliver G.¹

Affiliation:

1. Institute for Integrative Nanosciences, IFW Dresden, Helmholtzstr. 20, 01069 Dresden, Germany

2. Institute for Complex Materials, IFW Dresden, Helmholtzstr. 20, 01069 Dresden, Germany

Funder

IFW Dresden Excellence Project

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5033996

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