High temperature platinum etching using Ti mask layer-Reference-Cited by-同舟云学术

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High temperature platinum etching using Ti mask layer

Published:1999-07 Issue:4 Volume:17 Page:2151-2155
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kim Hyoun-woo,Ju Byong-Sun,Nam Byeong-Yun,Yoo Won-Jong,Kang Chang-Jin,Ahn Tae-Hyuk,Moon Joo-Tae,Lee Moon-Yong

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.581741

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. TiO2 microring resonators with high Q and compact footprint fabricated by a bottom-up method;Optics Letters;2020-09-04

2. Mechanism of premature etch stop in high-density magnetic-tunnel-junction patterning using CO/NH3 plasma with Ta mask;Journal of Vacuum Science & Technology B;2020-07

3. Patterning of platinum (Pt) thin films by chemical wet etching in Aqua Regia;Journal of Micromechanics and Microengineering;2012-05-29

4. A Low Damage Etching Process of Sub-100 nm Platinum Gate Line for III–V Metal–Oxide–Semiconductor Field-Effect Transistor Fabrication and the Optical Emission Spectrometry of the Inductively Coupled Plasma of SF$_{6}$/C$_{4}$F$_{8}$;Japanese Journal of Applied Physics;2012-01-20

5. A Low Damage Etching Process of Sub-100 nm Platinum Gate Line for III–V Metal–Oxide–Semiconductor Field-Effect Transistor Fabrication and the Optical Emission Spectrometry of the Inductively Coupled Plasma of SF6/C4F8;Japanese Journal of Applied Physics;2012-01-01

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