Area-selective chemical vapor deposition of cobalt from dicobalt octacarbonyl: Enhancement of dielectric-dielectric selectivity by adding a coflow of NH3-Reference-Cited by-同舟云学术

Area-selective chemical vapor deposition of cobalt from dicobalt octacarbonyl: Enhancement of dielectric-dielectric selectivity by adding a coflow of NH3

Published:2020-05 Issue:3 Volume:38 Page:033401
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Zhang Zhejun V.¹,Liu Sumeng²,Girolami Gregory S.²,Abelson John R.¹

Affiliation:

1. Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, 1304 W. Green St., Urbana, Illinois 61801

2. School of Chemical Sciences, University of Illinois at Urbana Champaign, 600 South Mathews Avenue, Urbana, Illinois 61801

Funder

National Science Foundation

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.5144501

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