Sputter‐initiated resonance ionization spectroscopy: A matrix‐independent sub‐parts‐per‐billion sensitive technique applied to diffusion studies in SiO2

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Sputter‐initiated resonance ionization spectroscopy: A matrix‐independent sub‐parts‐per‐billion sensitive technique applied to diffusion studies in SiO2–InP interfaces

Published:1990-05 Issue:3 Volume:8 Page:2318-2322
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Arlinghaus H. F.,Spaar M. T.,Thonnard N.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576756

Cited by 36 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface and Thin-Film Analysis, 3. Ion Detection;Ullmann's Encyclopedia of Industrial Chemistry;2011-10-15

2. Laser Secondary Neutral Mass Spectrometry (Laser-SNMS);Surface and Thin Film Analysis;2011-04-12

3. Microarea analysis of iron and phosphorus by resonance photoionization sputtered neutral mass spectrometry;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2007-07

4. A resonance photoionization sputtered neutral mass spectrometry instrument for submicron microarea analysis of ULSI devices;Applied Surface Science;2003-01

5. Surface and Thin-Film Analysis;Ullmann's Encyclopedia of Industrial Chemistry;2002-01-15

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