Batch processing of aluminum nitride by atomic layer deposition from AlCl3 and NH3
Author:
Affiliation:
1. Beneq Oy, Olarinluoma 9, 02200 Espoo, Finland
Funder
Tekes
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5079509
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