Quick estimation of physical etching of SiO2 among etchers with decoupled plasma sources
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Published:2003-05
Issue:3
Volume:21
Page:577-581
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ISSN:0734-2101
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Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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language:en
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Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Author:
Ding Guowen,Wu Wei-Te,Mak Steve,Yau Wai-Fan
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics