Electron beam lithography using fixed beam moving stage-Reference-Cited by-同舟云学术

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Electron beam lithography using fixed beam moving stage

Published:2017-09 Issue:5 Volume:35 Page:051601
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Khodadad Iman,Nelson-Fitzpatrick Nathan,Burcham Kevin,Hajian Arsen,Saini Simarjeet S.

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4997018

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication of high-Q multimode microring resonators on a photonic silicon-on-insulator platform;Integrated Photonics Platforms III;2024-06-18

2. Fabrication of gallium nitride waveguide resonators by high-power impulse magnetron sputtering at room temperature;APL Photonics;2024-01-01

3. Electron Beam Lithography;Nanofabrication;2024

4. Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography;Journal of Vacuum Science & Technology B;2023-01

5. Fabrication of sputtering-GaN waveguide resonators;Frontiers in Optics + Laser Science 2023 (FiO, LS);2023

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