Simultaneous molecular beam epitaxy growth at multiple uniform substrate temperatures-Reference-Cited by-同舟云学术

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Simultaneous molecular beam epitaxy growth at multiple uniform substrate temperatures

Published:2018-01 Issue:1 Volume:36 Page:011203
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

May Brelon J.¹,Myers Roberto C.²

Affiliation:

1. Department of Materials Science and Engineering, The Ohio State University, Columbus, Ohio 43210

2. Department of Materials Science and Engineering, Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5008523

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhanced uniformity of III-nitride nanowire arrays on bulk metallic glass and nanocrystalline substrates;Journal of Vacuum Science & Technology B;2019-05

2. Controlled nucleation of monolayer MoSe2 islands on Si (111) by MBE;Journal of Vacuum Science & Technology B;2019-03

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