Effect of substrate bias and oxygen partial pressure on properties of RF magnetron sputtered HfO2 thin films-Reference-Cited by-同舟云学术

Effect of substrate bias and oxygen partial pressure on properties of RF magnetron sputtered HfO2 thin films

Published:2014-05 Issue:3 Volume:32 Page:03D104
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Maidul Haque Sk.,Sagdeo Pankaj R.,Balaji Shanmugam,Sridhar Kalavathi,Kumar Sanjiv,Bhattacharyya Debarati,Bhattacharyya Dibyendu,Sahoo Naba K.

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4825234

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