Impact of Nb and Al content in arc evaporation targets on Ti1−xyAlxNbyN coating properties

Author:

Dempwolf Henry1ORCID,Malz Sinah2ORCID,Schacht Alexander1,Fabry Christian1,Baumann Axel3,Kessler Olaf2ORCID

Affiliation:

1. DOT GmbH 1 , Charles Darwin-Ring 1a, Rostock D-18059, Germany

2. Chair of Materials Science, Faculty of Mechanical Engineering and Marine Technology, University of Rostock 2 , Albert-Einstein-Str. 2, Rostock D-18059, Germany

3. MSC Medical Surface Consulting 3 , Heulerweg 5, Rostock D-18059, Germany

Abstract

Titanium-based physical vapor deposition (PVD) coatings, such as titanium nitride (TiN) and titanium niobium nitride (TiNbN), are common solutions for surface modifications in medical applications. Ex vivo studies of retrieved knee implants indicate the demand for increased scratch and abrasion resistance of PVD coatings in clinical applications. Based on the promising mechanical performance of titanium aluminum nitride (TiAlN) as a coating for tools, the aim of this study was to evaluate the impact of the chemical composition of titanium-based nitride coatings with aluminum (Al) and niobium (Nb). Nine titanium aluminum niobium nitride (Ti1−x−yAlxNbyN) coatings with 0.4 ≤ x < 0.7 and 0 ≤ y ≤ 0.18, as well as commercial TiN and TiNbN, were coated in an industrial scale arc PVD process, following a randomized, multifactorial response surface design. The deposition rate, the scratch resistance, and the hardness were measured following standardized protocols. The microstructure of the coating was analyzed by SEM and XRD. In addition, the surface roughness was determined by laser scanning microscopy. A quadratic regression was performed to determine the impact of the chemical composition on coating properties. Experimental results and regression analyses revealed the significant impact of the chemical composition of Ti1−x−yAlxNbyN on the coating microstructure, mechanics, and morphology. Scratch resistance for initial crack formation and cohesive failure could be increased decisively, compared to TiN.

Publisher

American Vacuum Society

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