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Precise control of time-varying effusion cell flux in molecular beam epitaxy

  • Published:2021-07 Issue:4 Volume:39 Page:043407
  • ISSN:0734-2101
  • Container-title:Journal of Vacuum Science & Technology A
  • language:en
  • Short-container-title:Journal of Vacuum Science & Technology A

Author:

Deimert Chris1ORCID,Wasilewski Zbig R.1234ORCID

Affiliation:

1. Department of Electrical and Computer Engineering, University of Waterloo, 200 University Ave. West, Waterloo, Ontario N2L 3G1, Canada

2. Department of Physics and Astronomy, University of Waterloo, 200 University Ave. West, Waterloo, Ontario N2L 3G1, Canada

3. Waterloo Institute for Nanotechnology (WIN), University of Waterloo, 200 University Ave. West, Waterloo, Ontario N2L 3G1, Canada

4. Institute for Quantum Computing (IQC), University of Waterloo, 200 University Ave. West, Waterloo, Ontario N2L 3G1, Canada

Funder

Canada First Research Excellence Fund

Natural Sciences and Engineering Research Council of Canada

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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