Effects of low‐energy low‐flux ion bombardment on the properties of VO2 thin films-Reference-Cited by-同舟云学术

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Effects of low‐energy low‐flux ion bombardment on the properties of VO2 thin films

Published:1989-05 Issue:3 Volume:7 Page:1194-1198
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Case Francine C.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576252

Cited by 25 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Selective Gamma-Ray Ionisation of Vanadium Oxides: Towards the Formation of VO2;Nano-Horizons: Journal of Nanosciences and Nanotechnologies;2023-12-20

2. Nano-structured VO2 based films for space application and radiative environment;Materials Today: Proceedings;2023-05

3. Cluster-coalesced defects induced by gamma irradiation on pulsed laser deposited VO2 thin films;Materials Today: Proceedings;2022

4. Effect of neutron irradiation on the structural, electrical and optical properties evolution of RPLD VO2 films;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2019-03

5. Resonant photoemission spectroscopy of gamma irradiated VO2 films;MRS Advances;2018-04-10

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