Author:
Henderson R. C.,Mayer D. C.,Nash J. G.
Cited by
10 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Alignment and registration schemes for projection electron lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1991-11
2. Radiation Exposure;Semiconductor Lithography;1988
3. Microfabrication;Condensed Matter;1983
4. Alignment signals from silicon tapered steps for electron beam lithography;Journal of Applied Physics;1982-02
5. Nanometer-Scale Fabrication Techniques;VLSI Electronics Microstructure Science;1982