Thick film resist lithography for a-Si:H devices with high topography and long dry etch processes
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Published:2004
Issue:3
Volume:22
Page:1048
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ISSN:0734-2101
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Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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language:en
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Short-container-title:J. Vac. Sci. Technol. A
Author:
Chan Isaac,Nathan Arokia
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics