Comparison of Ar electron‐cyclotron‐resonance plasmas in three magnetic field configurations. I. Electron temperature and plasma density-Reference-Cited by-同舟云学术

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Comparison of Ar electron‐cyclotron‐resonance plasmas in three magnetic field configurations. I. Electron temperature and plasma density

Published:1994-09 Issue:5 Volume:12 Page:2767-2774
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Junck Kevin L.,Getty Ward D.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.579102

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Correlation of III/V semiconductor etch results with physical parameters of high-density reactive plasmas excited by electron cyclotron resonance;Plasma Science and Technology;2017-10-24

3. Determining electron temperature and electron density in moderate pressure H2/CH4microwave plasma;Journal of Physics D: Applied Physics;2014-05-01

4. A magnetically tapered plasma density for overcoming electron dephasing;Journal of Plasma Physics;2011-09-30

5. Numerical simulation of the creation of a tapered plasma channel by a nonuniform large magnetic field;Journal of Physics D: Applied Physics;2011-03-03

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