Polycarbonate as a negative-tone resist for electron-beam lithography-Reference-Cited by-同舟云学术

Polycarbonate as a negative-tone resist for electron-beam lithography

Published:2018-03 Issue:2 Volume:36 Page:021603
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Zheng Nan¹,Min Haodi²,Jiang Youwei²,Cheng Xing²

Affiliation:

1. Department of Materials Science and Engineering, Southern University of Science and Technology, No. 1088, Xueyuan Blvd., Nanshan District, Shenzhen, Guangdong 518055, People's Republic of China

2. Department of Materials Science and Engineering, Shenzhen Key Laboratory of Nanoimprint Technology, Southern University of Science and Technology, 1088 Xueyuan Blvd., Nanshan District, Shenzhen, Guangdong 518055, People's Republic of China

Funder

Pearl River Talent Recruitment Program

Shenzhen Science and Technology Innovation Committee

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5012028

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