Pattern distortions in stencil masks-Reference-Cited by-同舟云学术

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Pattern distortions in stencil masks

Published:1994-11 Issue:6 Volume:12 Page:3543
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Randall John N.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A review of ion projection lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-05

2. Pattern placement errors in mask membranes;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-11

3. Low energy electron proximity printing using a self-assembled monolayer resist;Microelectronic Engineering;1996-01

4. Distortion analysis of stencil masks with stress-relief structures;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-11

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