Interfacial behavior of Cr–Au films in the 423–573‐K temperature range-Reference-Cited by-同舟云学术

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Interfacial behavior of Cr–Au films in the 423–573‐K temperature range

Published:1979-01 Issue:1 Volume:16 Page:25-30
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Hampy R. E.,Yost F. G.,Ganyard F. P.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.569863

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. In-depth evolution of chemical states and sub-10-nm-resolution crystal orientation mapping of nanograins in Ti(5 nm)/Au(20 nm)/Cr(3 nm) tri-layer thin films;Applied Surface Science;2018-09

2. Damage of Cr film by oxygen plasma;Applied Surface Science;2014-05

3. Increased Stability of Glycol-Terminated Self-Assembled Monolayers for Long-Term Patterned Cell Culture;Langmuir;2012-02-22

4. Thermo-mechanical evolution of multilayer thin films: Part II. Microstructure evolution in Au/Cr/Si microcantilevers;Thin Solid Films;2007-02

5. Gold Metal-Catalyzed Reactions of Isocyanides with Primary Amines and Oxygen: Analogies with Reactions of Isocyanides in Transition Metal Complexes;Journal of the American Chemical Society;2006-07-25

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