Photomask plasma etching: A review

Author:

Wu Banqiu

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 48 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Micro-discharge in tortuous pores: ‘splitting-quenching’ of primary ionization wave and the role of pre-ionization;Plasma Sources Science and Technology;2024-03-01

2. Simulation of silicon etching in NF3 plasma reactor;Pramana;2023-06-29

3. Atomic layer etching of Sn by surface modification with H and Cl radicals;Nanotechnology;2022-11-04

4. Dry heterometallic resist processing based on thermal sublimation deposition and development;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-09-19

5. Massive tiny MoSi defect reduction in NCAR photoresist blank;Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology;2022-09-16

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