The influence of microstructure on stress state of sputter deposited chromium nitride films-Reference-Cited by-同舟云学术

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The influence of microstructure on stress state of sputter deposited chromium nitride films

Published:1990-09 Issue:5 Volume:8 Page:3819-3826
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Fabis P. M.,Cooke R. A.,McDonough S.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576455

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Variable-range hopping conduction in epitaxial CrN(001);Physical Review B;2011-04-25

2. CrN electronic structure and vibrational modes: An optical analysis;Physical Review B;2010-07-20

3. Microstructure of the composite oxynitrided chromium layers produced on steel by a duplex method;Surface and Coatings Technology;2006-12

4. MOCVD of hard metallurgical coatings: Examples in the Cr–C–N system;Electrochimica Acta;2005-08

5. Nanostructured chromium nitride films with a valley of residual stress;Thin Solid Films;2005-01

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