Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor-Reference-Cited by-同舟云学术

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Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor

Published:2016-01 Issue:1 Volume:34 Page:01A129
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Yang Mengdi,Aarnink Antonius A. I.,Kovalgin Alexey Y.,Gravesteijn Dirk. J.,Wolters Rob A. M.,Schmitz Jurriaan

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4936387

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4. Synthesis and Characterization of Boron Thin Films Using Chemical and Physical Vapor Depositions;Coatings;2022-05-16

5. Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors;Applied Surface Science;2021-12

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