Synchrotron‐radiation‐excited etching and total electron yield measurement of silicon and silicon nitride
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Published:1995-09
Issue:5
Volume:13
Page:2451-2455
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ISSN:0734-2101
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Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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language:en
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Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Author:
Kitamura Osamu,Terakado Shingo,Suzuki Shigeo,Nakao Masao,Sekitani Tetsuji,Tanaka Kenichiro
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics