Reliability improvements of TiN/Al2O3/TiN for linear high voltage metal–insulator–metal capacitors using an optimized thermal treatment-Reference-Cited by-同舟云学术

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Reliability improvements of TiN/Al2O3/TiN for linear high voltage metal–insulator–metal capacitors using an optimized thermal treatment

Published:2017-01 Issue:1 Volume:35 Page:01A111
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Lefevre Aude,Ferreira Delphine,Veillerot Marc,Barnes Jean-Paul,Parat Guy,Czernohorsky Malte,Lallemand Florent

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4972232

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Demonstration and characterization of 500 V MIM capacitor with Al2O3 dielectric layer for power integrated circuits;Solid-State Electronics;2021-12

2. Atomic Layer-Deposited Al2O3 Interlayer for Improved Tribological and Anti-corrosion Properties of TiN Hard Coating on 316L Stainless Steel;Journal of Materials Engineering and Performance;2019-11

3. AFM study on the surface morphologies of TiN films prepared by magnetron sputtering and Al 2 O 3 films prepared by atomic layer deposition;Vacuum;2018-07

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