Converging lithography by combination of electrostatic layer-by-layer self-assembly and 193 nm photolithography: Top-down meets bottom-up-Reference-Cited by-同舟云学术

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Converging lithography by combination of electrostatic layer-by-layer self-assembly and 193 nm photolithography: Top-down meets bottom-up

Published:2006 Issue:5 Volume:24 Page:2209
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Hah Jung Hwan,Mayya Subramanya,Hata Mitsuhiro,Jang Yun-Kyeong,Kim Hyun-Woo,Ryoo Manhyoung,Woo Sang-Gyun,Cho Han-Ku,Moon Joo-Tae

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

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