Effect of two-step post-treatment on optical properties, microstructure, and nanosecond laser damage threshold of HfO2/TiO2/SiO2 multilayer high reflection films-Reference-Cited by-同舟云学术

Effect of two-step post-treatment on optical properties, microstructure, and nanosecond laser damage threshold of HfO2/TiO2/SiO2 multilayer high reflection films

Published:2019-12 Issue:6 Volume:37 Page:061503
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Mao Sida¹,Fan Jie¹^ORCID,Zou Yonggang¹,Lan Yunping¹,Xu Yingtian¹,Zhang Jiabin¹,Dong Jianing¹,Ma Xiaohui¹

Affiliation:

1. State Key Laboratory of High-power Semiconductor Laser, Changchun University of Science and Technology, Changchun 130022, China

Funder

Department of Science and Technology of Jilin Province

Education Department of Jilin Province

Youth Science Foundation of Jilin Province

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5116294

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