Reduction of residual gas in a sputtering system by auxiliary sputter of rare-earth metal-Reference-Cited by-同舟云学术

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Reduction of residual gas in a sputtering system by auxiliary sputter of rare-earth metal

Published:2002-01 Issue:1 Volume:20 Page:33-36
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Li Dejie

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1421597

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dysprosium magneto-optical traps;Physical Review A;2010-10-21

2. Fabrication and characterization of transparent conductive ZnO:Al thin films prepared by direct current magnetron sputtering with highly conductive ZnO(ZnAl2O4) ceramic target;Journal of Crystal Growth;2003-01

3. Fabrication and vacuum annealing of transparent conductive AZO thin films prepared by DC magnetron sputtering;Vacuum;2002-12

4. Magnetron sputtered AZO thin films on commercial ITO glass for application of a very low resistance transparent electrode;Journal of Physics D: Applied Physics;2002-11-18

5. Influence of post-deposition annealing on the properties of transparent conductive nanocrystalline ZAO thin films prepared by RF magnetron sputtering with highly conductive ceramic target;Thin Solid Films;2002-10

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