Spatial distribution of sputtered atoms from magnetron source-Reference-Cited by-同舟云学术

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Spatial distribution of sputtered atoms from magnetron source

Published:1987-07 Issue:4 Volume:5 Page:1750-1754
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Swann S.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.574530

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The sputter performance of an industrial-scale planar Mo-target over its lifetime: Target erosion and film properties;Surface and Coatings Technology;2020-01

2. Magnetron sputter deposition as visualized by Monte Carlo modeling;Thin Solid Films;2012-08

3. Experimental determination and simulation of the angular distribution of the metal flux during magnetron sputter deposition;Journal of Physics D: Applied Physics;2010-02-05

4. The use of camera obscura in sputter deposition;Vacuum;2009-08

5. Radio frequency magnetron sputtering deposition of calcium phosphate coatings: The effect of resputtering on the coating composition;Journal of Applied Physics;2003-06-15

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