Oxidation and oxidative vapor-phase etching of few-layer MoS2-Reference-Cited by-同舟云学术

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Oxidation and oxidative vapor-phase etching of few-layer MoS2

Published:2017-03 Issue:2 Volume:35 Page:021203
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Walter Timothy N.,Kwok Frances,Simchi Hamed,Aldosari Haila M.,Mohney Suzanne E.

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4975144

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3. Anodic Dissolution Rates Accelerate with Decreasing MoS₂ Nanoflake Thickness;Journal of The Electrochemical Society;2023-11-01

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