Transitions between field emission and vacuum breakdown in nanoscale gaps

Author:

Wang Haoxuan1ORCID,Loveless Amanda M.1ORCID,Darr Adam M.1ORCID,Garner Allen L.123ORCID

Affiliation:

1. School of Nuclear Engineering, Purdue University, West Lafayette, Indiana 47906

2. Elmore Family School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907

3. Department of Agricultural and Biological Engineering, Purdue University, West Lafayette, Indiana 47907

Abstract

The continuing reduction in device size motivates a more fundamental understanding of breakdown and electron emission for nanoscale gaps. While prior experiments have separately studied breakdown and electron emission in vacuum gaps, no study has comprehensively examined the transitions between these mechanisms. In this study, we measure the current-voltage [Formula: see text] curves for electrodes with different emitter widths for 20–800 nm gaps at vacuum (∼1  μTorr) to measure breakdown voltage and assess electron emission behavior. The breakdown voltage [Formula: see text] increases linearly with increasing gap distance from ∼15 V at 20 nm to ∼220 V at 300 nm and remains nearly constant for larger gaps; [Formula: see text] does not depend strongly on the emitter width. Breakdown can proceed directly from the field emission regime. Nexus theory, which predicts transitions between space-charge limited current (SCLC) and field emission (FE), shows that the experimental conditions are in the Fowler–Nordheim regime and within a factor of 0.7 to the FE-SCLC transition. We also present the results of electrode damage by emission current-induced heating to explain the flattening of [Formula: see text] at larger gaps that was absent in previous experiments for similar gap distances at atmospheric pressure.

Funder

Office of Naval Research

Air Force Office of Scientific Research

Purdue Doctoral Fellowship

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

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