Author:
Xu Songlin,Lill Thorsten,Podlesnik Dragan
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
15 articles.
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1. Systematic procedure to optimize chamber seasoning conditions with optical emission spectroscopy in plasma etching;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2014-03
2. Multiple input multiple output controller design to match chamber performance in plasma etching for semiconductor manufacturing;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-11
3. Evaluation of Growth and Cleaning Rates of Chamber-Wall Deposition during Silicon Gate Etching;e-Journal of Surface Science and Nanotechnology;2013
4. A set of cross sections and transport coefficients for electrons in HBr;Chemical Physics;2012-04
5. Impact of metal etch residues on etch species density and uniformity;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-07