Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates-Reference-Cited by-同舟云学术

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Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates

Published:2002 Issue:6 Volume:20 Page:1955
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:J. Vac. Sci. Technol. A

Author:

Yang G. H.,Oh S. W.,Kang E. T.,Neoh K. G.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of bias voltage on the Ar/CH₂F₂/O₂ plasma etching of Si₃N₄ films;Japanese Journal of Applied Physics;2024-08-01

2. Optical and Electrical Characteristics of Fluorocarbon Films Deposited in a High-Density C₄F₈ Plasma;KOREAN CHEM ENG RES;2021

3. Grignard synthesis of fluorinated nanoporous element organic frameworks based on the heteroatoms P, B, Si, Sn and Ge;Polymer Chemistry;2019

4. Hydrophobic and superhydrophobic surfaces fabricated by plasma polymerization of perfluorohexane, perfluoro(2-methylpent-2-ene), and perfluoro(4-methylpent-2-ene);Journal of Adhesion Science and Technology;2015-06-09

5. Plasma deposited fluorinated films on porous membranes;Materials Chemistry and Physics;2015-02

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