Topography and microstructure of Al films formed under various deposition conditions-Reference-Cited by-同舟云学术

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Topography and microstructure of Al films formed under various deposition conditions

Published:1991-05 Issue:3 Volume:9 Page:559-562
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Chang C. Y.,Vook R. W.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577409

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5. Effects of deposition and annealing conditions on the defects in the Al/glass composites of TFT specimens;Journal of Materials Science: Materials in Electronics;2014-07-24

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