Effect of adding an insulator between metal and semiconductor layers on contact resistance-Reference-Cited by-同舟云学术

Effect of adding an insulator between metal and semiconductor layers on contact resistance

Published:2018-05 Issue:3 Volume:36 Page:032202
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Kim Hyunjung¹,Jang Woochool²,Lim Heewoo,Kweon Youngkyun,Bang Minwook,Kwon Saejin,Kim Bumsik,Cho Haewon,Jeon Hyeongtag³

Affiliation:

1. Division of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, South Korea

2. Division of Materials Science and Engineering, Hanyang University, Seoul 04763, South Korea

3. Division of Materials Science and Engineering, Hanyang University, Seoul 04763, South Korea and Division of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, South Korea

Funder

National Research Foundation of Korea

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5020310

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