Alkaline soluble polysiloxane electron-beam resist for 0.2 μm rule 256 Mbit dynamic random access memory fabrication
-
Published:1993-03
Issue:2
Volume:11
Page:281
-
ISSN:0734-211X
-
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
-
language:
-
Short-container-title:J. Vac. Sci. Technol. B
Author:
Hashimoto Kazuhiko
Publisher
American Vacuum Society
Subject
General Engineering