Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor-Reference-Cited by-同舟云学术

Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor

Published:2009-01 Issue:1 Volume:27 Page:13-19
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Sung Dougyong,Jeong Sangmin,Park Youngmin,Volynets Vladimir N.,Ushakov Andrey G.,Kim Gon-Ho

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3010717

Cited by 33 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma sources sputtering nanoscale contaminants with low-energy ion flux on front-end mirrors in ITER optical diagnostics;Japanese Journal of Applied Physics;2024-09-02

2. Stability and plasma etching behavior of yttrium-based coatings by air plasma spray process;Surface and Coatings Technology;2023-02

3. Radio-frequency plasma to clean ITER front-end diagnostic mirrors in geometry of Edge Thomson Scattering system;Physica Scripta;2022-12-05

4. Radially-dependent ignition process of a pulsed capacitively coupled RF argon plasma over 300 mm-diameter electrodes: multi-fold experimental diagnostics;Plasma Sources Science and Technology;2021-12-01

5. Modulation of the plasma uniformity by coil and dielectric window structures in an inductively coupled plasma;Plasma Science and Technology;2021-08-19