Reactive ion etching of polyimidesiloxanes in fluorine‐containing discharges-Reference-Cited by-同舟云学术

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Reactive ion etching of polyimidesiloxanes in fluorine‐containing discharges

Published:1992-07 Issue:4 Volume:10 Page:1124-1127
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Jeng S.,Kwok H. S.,Tyrell J. A.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.578213

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma etching of benzocyclobutene in CF4∕O2 and SF6∕O2 plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2006-05

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