Assessing thermal Cl2 etching and regrowth as methods for surface passivation-Reference-Cited by-同舟云学术

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Assessing thermal Cl2 etching and regrowth as methods for surface passivation

Published:1990-11 Issue:6 Volume:8 Page:1960
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Clausen E. M.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Strategies of Nanoscale Semiconductor Lasers;Nanotechnology for Electronic Materials and Devices;2007

2. Nanolasers: lasing from nanoscale quantum wires;International Journal of Nanotechnology;2004

3. Electronic properties of etched–regrown heterostructure interfaces;Journal of Crystal Growth;2003-04

4. Etching temperature dependent mobilities up to at chlorine etched and regrown interfaces;Physica E: Low-dimensional Systems and Nanostructures;2002-03

5. Local probe techniques for luminescence studies of low-dimensional semiconductor structures;Journal of Applied Physics;1998-08-15

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