Initial oxidation of silicon (100): A unified chemical model for thin and thick oxide growth rates and interfacial structure
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Published:1995-07
Issue:4
Volume:13
Page:1618
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
28 articles.
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