Compositional and electrical properties of zirconium dioxide thin films chemically deposited on silicon-Reference-Cited by-同舟云学术

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Compositional and electrical properties of zirconium dioxide thin films chemically deposited on silicon

Published:2003-05 Issue:3 Volume:21 Page:653-659
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Harasek S.,Wanzenboeck H. D.,Bertagnolli E.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1566786

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation on depth resolved compositions of e-beam deposited ZrO2 thin film;Applied Surface Science;2017-10

2. Modeling and Characterization of Gate Leakage in High-K Metal Gate Technology-Based Embedded DRAM;IEEE Transactions on Electron Devices;2013-12

3. A Comprehensive Study of Thermal Stability on Microstructure and Residual Stress for ALD HfZrO2 Films at 28nm HKMG CMOS Applications;ECS Transactions;2013-08-31

4. Growth, dielectric properties, and memory device applications of ZrO2 thin films;Thin Solid Films;2013-03

5. Metallic Materials Deposition: Metal-Organic PrecursorsUpdate based on the original article by Charles H. Winter, Wenjun Zheng and Hani M. El-Kaderi,Encyclopedia of Inorganic ChemistrySecond Edition, © 2005, John Wiley & Sons, Ltd.;Encyclopedia of Inorganic and Bioinorganic Chemistry;2012-12-17

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