An x‐ray standing wave interference spectrometric analysis of chemisorption of selenium on silicon(111) and (220) surfaces-Reference-Cited by-同舟云学术

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An x‐ray standing wave interference spectrometric analysis of chemisorption of selenium on silicon(111) and (220) surfaces

Published:1985-05 Issue:3 Volume:3 Page:946-949
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Dev B. N.,Thundat T.,Gibson W. M.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.573357

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Etching Kinetics of Si(111) Surface by Selenium Molecular Beam;Optoelectronics, Instrumentation and Data Processing;2020-09

2. Etching of step-bunched Si(1 1 1) surface by Se molecular beam observed by in situ REM;Journal of Crystal Growth;2020-01

3. Adsorption of selenium atoms at the Si(111)-7×7 surface: A combination of scanning tunnelling microscopy and density functional theory studies;Chemical Physics;2011-04

4. STM Study on Initial Te Adsorption on Si(111) 7 * 7 Surface;e-Journal of Surface Science and Nanotechnology;2006

5. A Study of the restoration of Se/Si()-7×7 reconstructed surfaces: preservation of the bulk-terminated state;Surface Science;2002-04

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