Author:
Küpper Daniel,Küpper David,Wahlbrink Thorsten,Henschel Wolfgang,Bolten Jens,Lemme Max C.,Georgiev Yordan M.,Kurz Heinrich
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
Cited by
8 articles.
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1. Development of EUV interference lithography for 25 nm line/space patterns;Micro and Nano Engineering;2023-09
2. Challenges in Electron Beam Lithography of Silicon Nanostructures;2022 IEEE 22nd International Conference on Nanotechnology (NANO);2022-07-04
3. Dendrimers as Dopant Atom Carriers;Dendrimers - Fundamentals and Applications;2018-04-25
4. New Generation Electron Beam Resists: A Review;Chemistry of Materials;2017-02-27
5. Correlation of lithographic performance of the electron beam resists SML and ZEP with their chemical structure;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-07