Surface characterization of ultrathin atomic layer deposited molybdenum oxide films using high-sensitivity low-energy ion scattering-Reference-Cited by-同舟云学术

Surface characterization of ultrathin atomic layer deposited molybdenum oxide films using high-sensitivity low-energy ion scattering

Published:2021-12 Issue:6 Volume:39 Page:063210
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Singhania Raivathari M.¹^ORCID,Price Henry¹,Kounga Vaneck Y.¹,Davis Benjamin¹,Brüner Philipp²,Thorpe Ryan³,Hynek David J.⁴,Cha Judy J.⁴^ORCID,Strandwitz Nicholas C.¹^ORCID

Affiliation:

1. Department of Materials Science and Engineering, Lehigh University, Bethlehem, Pennsylvania 18015

2. IONTOF GmbH, Heisenbergstr. 15, 48149 Münster, Germany

3. Institute for Functional Materials and Devices, Lehigh University, Bethlehem, Pennsylvania 18015

4. Energy Sciences Institute, Department of Mechanical Engineering and Materials Science, Yale University, West Haven, Connecticut 06516

Funder

National Science Foundation

NASA Graduate Student Fellowship

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/am-pdf/10.1116/6.0001164

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