Role of electron and ion irradiation in a reliable lift-off process with electron beam evaporation and a bilayer PMMA resist system-Reference-Cited by-同舟云学术

Role of electron and ion irradiation in a reliable lift-off process with electron beam evaporation and a bilayer PMMA resist system

Published:2021-09 Issue:5 Volume:39 Page:052601
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Sun Bin¹^ORCID,Grap Thomas¹²,Frahm Thorben¹^ORCID,Scholz Stefan¹,Knoch Joachim¹^ORCID

Affiliation:

1. Institute of Semiconductor Electronics, RWTH Aachen University, 52056 Aachen, Germany

2. Helmholtz Nano Facility of the Forschungszentrum Jülich, 52428 Jülich, Germany

Funder

Deutsche Forschungsgemeinschaft

China Scholarship Council

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0001161

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