As2S3 thin films deposited by atomic layer deposition
Author:
Affiliation:
1. Division of Materials Physics, Department of Physics, University of Helsinki, FI-00014 Helsinki, Finland
Funder
Luonnontieteiden ja Tekniikan Tutkimuksen Toimikunta (Forskningsrådet för Naturvetenskap och Teknik)
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.4968202
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