Assessment of atomic layer deposited TiO2 photocatalytic self-cleaning by quartz crystal microbalance-Reference-Cited by-同舟云学术

Assessment of atomic layer deposited TiO2 photocatalytic self-cleaning by quartz crystal microbalance

Published:2020-07 Issue:4 Volume:38 Page:043404
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Henry Théo¹,Martins Paolo²,Eustache Etienne²,Servet Bernard²,Divay Laurent²,Jouanne Pierre³,Grasset Philippe³,Dudon Jean-Paul³,Hugonnot Patrick³,Fleury-Frenette Karl¹

Affiliation:

1. Surface Micro & Nano Engineering Laboratory, Centre Spatial de Liège (CSL), Space Sciences, Technologies and Astrophysics Research (STAR) Institute, University of Liège, Avenue du Pré-Aily, Liege Science Park, B29 4031 Angleur, Belgium

2. Thales Research & Technology France, Campus Polytechnique, 1 avenue Augustin Fresnel, 91767 Palaiseau Cedex, France

3. Thales Alenia Space, 5 Allée des Gabins BP99, 06156 Cannes La Bocca Cedex, France

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000198

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